Niobium Targets & Machined Parts
Niobium targets and machined parts are essential components in various applications, particularly in the field of superconductors and particle accelerators. These materials exhibit exceptional thermal and mechanical properties, making them crucial for achieving optimal performance in advanced scientific and industrial settings. Niobium targets and machined parts contribute significantly to the development of technologies in fields such as medical imaging, electronics, and materials science.
Material: RO4200-1, RO4210-2
Circular Targets: Diameter 10mm up to 400mm x Thickness 2mm up to 28mm
Rectangular Targets: Thickness 1mm up to 20.32mm x Width up to 800mm x Length up to 3000mm
Purity: 99.995% min; 99.99% min; 99.95% min
| Recrystallization | 95％min |
| Grain size | ASTM 4 or finer |
| Surface finish | 16Rms max. or Ra 0.4 (RMS64 or better) |
| Flatness | 0.1mm or 0.15％ max |
| Tolerance | +/-0.010″ on all dimensions |
The function of the niobium sputtering target mirrors that of its raw material. Niobium, a strong, light gray, crystalline, and ductile transition metal, shares hardness akin to pure titanium and ductility comparable to iron when in its pure form. Its applications extend to various superconducting materials. These superconducting alloys, incorporating titanium and tin, find widespread use in the construction of MRI scanner superconducting magnets. Niobium is also employed in welding, nuclear industries, electronics, optics, numismatics, and jewelry.
The Niobium Sputtering Target is manufactured using electron beam melting technology and is commonly utilized in applications such as touch screens, optical lenses, and glass coating.
T&D specializes in the production of Niobium sputtering targets, offering a variety of shapes and purities tailored for applications in the semi-conductive and micro-electronics industries. Our Niobium sputtering targets stand out due to their enhanced density, reduced average particle size, and high purity, achieved through our unique forming processes. As a result, you can experience faster processing times with increased sputtering speed and consistently obtain Niobium layers of high quality.
Our adaptable production process allows for the customization of the microstructure to achieve your desired effect. When the grains of the sputtering target are consistently aligned, users can enjoy consistent erosion rates and the formation of uniform layers.
Chemical purity plays a vital role in metal sputtering targets; higher purity levels result in films with exceptional electrical conductivity and reduced particle formation during the PVD process.
Analytical Methods:
1. Metallic elements were analyzed by GDMS and ICP-OES.
2. Gas elements were analyzed by LECO.
Preparation process of niobium sputtering target
Material Preparation – Forging – Machining – Rolling – Heat Treatment – Metallographic Inspection – Machining – Dimension Inspection – Cleaning – Final Inspection – Packaging
Niobium tube target and preparation method thereof
Initially, the niobium tube blank undergoes hot extrusion, followed by processing the hot-extruded niobium tube blank to create the inner hole, resulting in the niobium tube target blank. While preparing the niobium tube target, a layer of glass powder is applied to the surface of the niobium tube blank. This application of glass powder enhances lubrication during the extrusion process, leading to improved surface quality. Subsequent hot extrusion and heat treatment contribute to refining and homogenizing the grains of the niobium tube blank. Ultimately, the extruded niobium tube blank is machined using specialized tools for boring and milling the inner hole. This ensures continuous chip discharge from the inner hole, preventing chip accumulation issues that could impact inner hole surface processing. The result is a niobium target material with uniform internal grains and low surface roughness.
The use of niobium sputtering target
Targets made from niobium and niobium alloys find primary applications in surface engineering materials. These applications span various industries including shipbuilding, the chemical industry, liquid crystal display (LCD) manufacturing, heat-resistant and corrosion-resistant coatings, high-conductivity coating industries, thin-film solar industry, Low-E glass manufacturing, flat panel display industry, optical coating industry, as well as in tools and decorative coating applications.
Other alloy forms of niobium sputtering target
Niobium-tantalum, niobium-zirconium alloy targets, etc.
Manufacturing Capabilities
T&D is a certified domestic supplier adhering to ISO9001:2015 standards, specializing in providing Tungsten Carbide, Heavy Tungsten Alloy, Copper Tungsten, Tungsten, Molybdenum, Tantalum, and Niobium in the form of either semi-finished blanks or precision-machined parts. We offer customized machining services tailored to your specifications based on provided technical drawings. Our capabilities extend to prototyping as well as low-to-high volume production runs, ensuring comprehensive support for your specific requirements.
T&D Materials Manufacturing leverages modern equipment, cost-effective processes, and efficient lead times to offer customers high-quality products and exceptional customer service. Our capabilities encompass direct pressing and Metal Injection Molding (MIM), CNC preforming, Hot Isostatic Pressing (HIP) sintering for consistently high strength, and fully automated CNC finishing to achieve close tolerances and superior finishes.
All our tungsten and tantalum raw materials come from ”Conflict-Free” sources.
ITAR Compliant
T&D Materials Manufacturing Produces all products meeting industry standards of ISO, ASTM, ASM, MIL, and custom grades.
Purchasing options include blanket orders, just-in-time delivery, and consignment materials. If you are looking for high-quality W/Mo/Ta/Nb/WC/WCu/Re products, contact us today at 484-472-6863 or info@TDmfginc.com
